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- 2010537980 alternative "Annual BACUS Symposium on Photomask Technology.".
- 2010537980 alternative "BACUS Symposium on Photomask Technology.".
- 2010537980 alternative "Symposium on Photomask Technology.".
- 2010537980 contributor B12036788.
- 2010537980 contributor B12036789.
- 2010537980 contributor B12036790.
- 2010537980 created "c2008.".
- 2010537980 date "2008".
- 2010537980 date "c2008.".
- 2010537980 dateCopyrighted "c2008.".
- 2010537980 description "Includes bibliographical references and author index.".
- 2010537980 extent "2 v. :".
- 2010537980 identifier "0819473553 (pbk.)".
- 2010537980 identifier "9780819473554 (pbk.)".
- 2010537980 isPartOf "Proceedings of SPIE, 0277-786X ; v. 7122".
- 2010537980 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 7122.".
- 2010537980 issued "2008".
- 2010537980 issued "c2008.".
- 2010537980 language "eng".
- 2010537980 publisher "Bellingham, Wash. : SPIE,".
- 2010537980 subject "Integrated circuits Masks Congresses.".
- 2010537980 subject "Microlithography Congresses.".
- 2010537980 subject "TK7874 .S9434 2008".
- 2010537980 title "Photomask technology 2008 : 7-10 October 2008, Monterey, California, USA / Hiroichi Kawahira, Larry S. Zurbrick, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE.".
- 2010537980 type "text".