Matches in Library of Congress for { <http://lccn.loc.gov/2011008131> ?p ?o. }
Showing items 1 to 23 of
23
with 100 items per page.
- 2011008131 abstract "The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.".
- 2011008131 contributor B12109040.
- 2011008131 created "2011.".
- 2011008131 date "2011".
- 2011008131 date "2011.".
- 2011008131 dateCopyrighted "2011.".
- 2011008131 description "Includes bibliographical references and index.".
- 2011008131 description "The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.".
- 2011008131 extent "xvii, 337 p. :".
- 2011008131 identifier "1848212313".
- 2011008131 identifier "9781848212312 (hc)".
- 2011008131 identifier 2011008131-d.html.
- 2011008131 issued "2011".
- 2011008131 issued "2011.".
- 2011008131 language "eng".
- 2011008131 publisher "London : ISTE ; Hoboken, NJ : Wiley,".
- 2011008131 subject "621.3815/2 22".
- 2011008131 subject "Ion implantation.".
- 2011008131 subject "Semiconductor doping.".
- 2011008131 subject "Semiconductors Heat treatment.".
- 2011008131 subject "TK7871.85 .S5485 2011".
- 2011008131 title "Silicon technologies : ion implantation and thermal treatment / edited by Annie Baudrant.".
- 2011008131 type "text".