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- 2011026683 contributor B12131113.
- 2011026683 created "c2011.".
- 2011026683 date "2011".
- 2011026683 date "c2011.".
- 2011026683 dateCopyrighted "c2011.".
- 2011026683 description "Includes bibliographical references and index.".
- 2011026683 extent "xiii, 249 p. :".
- 2011026683 identifier "9781439800362 (hardcover : alk. paper)".
- 2011026683 issued "2011".
- 2011026683 issued "c2011.".
- 2011026683 language "eng".
- 2011026683 publisher "Boca Raton, FL : Taylor & Francis,".
- 2011026683 subject "621.3815 23".
- 2011026683 subject "Electrolytic grinding.".
- 2011026683 subject "Semiconductor wafers Finishing.".
- 2011026683 subject "Semiconductors Polishing.".
- 2011026683 subject "TK7871.85 .E424 2011".
- 2011026683 title "Electrolytic in-process dressing (ELID) techologies : fundamentals and applications / editors, Hitoshi Ohmori, Ioan D. Marinescu, Kazutoshi Katahira.".
- 2011026683 type "text".