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- 2011035501 contributor B12141515.
- 2011035501 created "c2012.".
- 2011035501 date "2012".
- 2011035501 date "c2012.".
- 2011035501 dateCopyrighted "c2012.".
- 2011035501 description "Includes bibliographical references (p. [123]-140) and index.".
- 2011035501 extent "xviii, 144 p. :".
- 2011035501 identifier "9781621003656 (hardcover)".
- 2011035501 issued "2012".
- 2011035501 issued "c2012.".
- 2011035501 language "eng".
- 2011035501 publisher "New York : Nova Publishers,".
- 2011035501 subject "621.044 23".
- 2011035501 subject "Plasma-enhanced chemical vapor deposition Computer simulation.".
- 2011035501 subject "Plasma-enhanced chemical vapor deposition Mathematical models.".
- 2011035501 subject "TS695.15 .S56 2012".
- 2011035501 title "Simulation of deposition processes with PECVD apparatus : theory and applicatios / Jüergen Geiser and Meraa Arab.".
- 2011035501 type "text".