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- 2011377574 alternative "Symposium on Photomask Technology".
- 2011377574 contributor B12246642.
- 2011377574 contributor B12246643.
- 2011377574 created "c2007.".
- 2011377574 date "2007".
- 2011377574 date "c2007.".
- 2011377574 dateCopyrighted "c2007.".
- 2011377574 description "Includes bibliographical references and author index.".
- 2011377574 extent "3 v. :".
- 2011377574 identifier "0819468878 (3 vol. set)".
- 2011377574 identifier "9780819468871 (3 vol. set)".
- 2011377574 isPartOf "Proceedings of SPIE, 0277-786X ; v. 6730".
- 2011377574 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 6730.".
- 2011377574 issued "2007".
- 2011377574 issued "c2007.".
- 2011377574 language "eng".
- 2011377574 publisher "Bellingham, Wash. : SPIE,".
- 2011377574 subject "621.36 23".
- 2011377574 subject "Integrated circuits Masks Congresses.".
- 2011377574 subject "Microlithography Congresses.".
- 2011377574 subject "TK7874 .P4645 2007".
- 2011377574 title "Photomask technology 2007 : 18-21 September, 2007, Monterey, California, USA / Robert J. Naber, Hiroichi Kawahira, editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE.".
- 2011377574 title "Symposium on Photomask Technology".
- 2011377574 type "text".