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- 2011434497 alternative "Photomask technology".
- 2011434497 contributor B12306348.
- 2011434497 contributor B12306349.
- 2011434497 created "2011.".
- 2011434497 date "2011".
- 2011434497 date "2011.".
- 2011434497 dateCopyrighted "2011.".
- 2011434497 description "Includes bibliographical references and indexes.".
- 2011434497 extent "323 p. :".
- 2011434497 identifier "4501328207".
- 2011434497 identifier "9784501328207".
- 2011434497 identifier ?partnerid=oclc&siteid=oclc.
- 2011434497 issued "2011".
- 2011434497 issued "2011.".
- 2011434497 language "jpn".
- 2011434497 publisher "Tōkyō : Tōkyō Denki Daigaku Shuppankyoku,".
- 2011434497 subject "Integrated circuits Large scale integration.".
- 2011434497 subject "Masks (Electronics)".
- 2011434497 subject "Microlithography Industrial applications.".
- 2011434497 subject "TK7872.M3 T36 2011".
- 2011434497 title "880-02 Fotomasuku : denshi buhin seizō no kikan gijutsu = Photomask technology / Tanabe Isao, Takehana Yōichi, Hōga Morihisa kyōcho.".
- 2011434497 title "Photomask technology".
- 2011434497 type "text".