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- 2012471867 alternative "AETNC".
- 2012471867 alternative "Also known as: Advanced Etch Technology for Nanopatterning Conference (AETNC)".
- 2012471867 contributor B12635460.
- 2012471867 contributor B12635461.
- 2012471867 created "c2012.".
- 2012471867 date "2012".
- 2012471867 date "c2012.".
- 2012471867 dateCopyrighted "c2012.".
- 2012471867 description "Includes bibliographical references and index.".
- 2012471867 extent "1 v. (various pagings) :".
- 2012471867 identifier "0819489840 (pbk.)".
- 2012471867 identifier "9780819489845 (pbk.)".
- 2012471867 isPartOf "Proceedings of SPIE, 0277-786X ; v. 8328".
- 2012471867 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 8328. 0277-786X".
- 2012471867 issued "2012".
- 2012471867 issued "c2012.".
- 2012471867 language "eng".
- 2012471867 publisher "Bellingham, Wash. : SPIE,".
- 2012471867 subject "Advanced etch technology".
- 2012471867 subject "Lithography Congresses.".
- 2012471867 subject "Nanopatterning".
- 2012471867 subject "Plasma etching Congresses.".
- 2012471867 subject "QC371 .S67 v. 8328".
- 2012471867 subject "TA2020 .A615 2012".
- 2012471867 title "AETNC".
- 2012471867 title "Advanced etch technology for nanopatterning : 13-14 February 2012, San Jose, California, United States / Ying Zhang, Gottlieb Oehrlein, Qinghuang Lin, editors ; sponsored ... by SPIE.".
- 2012471867 title "Also known as: Advanced Etch Technology for Nanopatterning Conference (AETNC)".
- 2012471867 type "text".