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- 2013016209 contributor B12723027.
- 2013016209 contributor B12723028.
- 2013016209 date "2013".
- 2013016209 description "Includes bibliographical references and index.".
- 2013016209 extent "pages cm".
- 2013016209 hasFormat "Atomic layer deposition".
- 2013016209 identifier "9781118062777 (cloth : alk. paper)".
- 2013016209 isFormatOf "Atomic layer deposition".
- 2013016209 issued "2013".
- 2013016209 language "eng".
- 2013016209 relation "Atomic layer deposition".
- 2013016209 subject "620/.5 23".
- 2013016209 subject "Chemical vapor deposition.".
- 2013016209 subject "Epitaxy.".
- 2013016209 subject "Microelectronics.".
- 2013016209 subject "Nanotechnology.".
- 2013016209 subject "TS695 .K33 2013".
- 2013016209 title "Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.".
- 2013016209 type "text".