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- 74020636%2F%2Fr83 contributor B2410721.
- 74020636%2F%2Fr83 created "[1975]".
- 74020636%2F%2Fr83 date "1975".
- 74020636%2F%2Fr83 date "[1975]".
- 74020636%2F%2Fr83 dateCopyrighted "[1975]".
- 74020636%2F%2Fr83 description "Includes bibliographical references and index.".
- 74020636%2F%2Fr83 extent "xi, 269 p. :".
- 74020636%2F%2Fr83 identifier "0070162301".
- 74020636%2F%2Fr83 issued "1975".
- 74020636%2F%2Fr83 issued "[1975]".
- 74020636%2F%2Fr83 language "eng".
- 74020636%2F%2Fr83 publisher "New York : McGraw-Hill,".
- 74020636%2F%2Fr83 subject "621.381/73".
- 74020636%2F%2Fr83 subject "Integrated circuits.".
- 74020636%2F%2Fr83 subject "Photoresists.".
- 74020636%2F%2Fr83 subject "Printed circuits.".
- 74020636%2F%2Fr83 subject "TK7874 .D42".
- 74020636%2F%2Fr83 title "Photoresist : materials and processes / W. S. DeForest.".
- 74020636%2F%2Fr83 type "text".