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- 75619089 contributor B2787865.
- 75619089 contributor B2787866.
- 75619089 contributor B2787867.
- 75619089 created "1975.".
- 75619089 date "1975".
- 75619089 date "1975.".
- 75619089 dateCopyrighted "1975.".
- 75619089 description "Includes bibliographical references.".
- 75619089 extent "v, 33 p. :".
- 75619089 isPartOf "NBS special publication ; 400-11.".
- 75619089 isPartOf "National Bureau of Standards special publication ; 400-11".
- 75619089 isPartOf "Semiconductor measurement technology".
- 75619089 issued "1975".
- 75619089 issued "1975.".
- 75619089 language "eng".
- 75619089 publisher "Washington : U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.,".
- 75619089 subject "389/.08 s 621.3815/.2/028".
- 75619089 subject "BASIC (Computer program language)".
- 75619089 subject "Diodes, Semiconductor Data processing.".
- 75619089 subject "Electric measurements Data processing.".
- 75619089 subject "Ion implantation Data processing.".
- 75619089 subject "QC100 .U57 no. 400-11 TK7871.85".
- 75619089 title "A BASIC program for calculating dopant density profiles from capacitance-voltage data / Richard L. Mattis and Martin G. Buehler.".
- 75619089 type "text".