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- 79000230%2F%2Fr852 contributor B3484633.
- 79000230%2F%2Fr852 contributor B3484634.
- 79000230%2F%2Fr852 contributor B3484635.
- 79000230%2F%2Fr852 created "1979.".
- 79000230%2F%2Fr852 date "1979".
- 79000230%2F%2Fr852 date "1979.".
- 79000230%2F%2Fr852 dateCopyrighted "1979.".
- 79000230%2F%2Fr852 description "Includes bibliographical references.".
- 79000230%2F%2Fr852 extent "iii, 28 p. :".
- 79000230%2F%2Fr852 isPartOf "NBS special publication ; 400-51".
- 79000230%2F%2Fr852 isPartOf "NBS special publication ; 400-51.".
- 79000230%2F%2Fr852 isPartOf "Semiconductor measurement technology".
- 79000230%2F%2Fr852 issued "1979".
- 79000230%2F%2Fr852 issued "1979.".
- 79000230%2F%2Fr852 language "eng".
- 79000230%2F%2Fr852 publisher "Washington : U.S. Dept. of Commerce, National Bureau of Standards : for sale by the Supt. of Docs., U.S. Govt. Print. Off.,".
- 79000230%2F%2Fr852 subject "602/.1 s 621.381/73/028".
- 79000230%2F%2Fr852 subject "Integrated circuits Masks Testing.".
- 79000230%2F%2Fr852 subject "QC100 .U57 no. 400-51 TK7874".
- 79000230%2F%2Fr852 title "A production-compatible microelectronic test pattern for evaluating photomask misalignment / T. J. Russell, D. A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.".
- 79000230%2F%2Fr852 type "text".