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- 81065237 contributor B3976258.
- 81065237 contributor B3976259.
- 81065237 contributor B3976260.
- 81065237 created "c1981.".
- 81065237 date "1981".
- 81065237 date "c1981.".
- 81065237 dateCopyrighted "c1981.".
- 81065237 description "Includes bibliographical references and indexes.".
- 81065237 extent "x, 336 p. :".
- 81065237 isPartOf "Proceedings (Electrochemical Society) ; v. 81-1.".
- 81065237 isPartOf "Proceedings / Electrochemical Society ; v. 81-1".
- 81065237 issued "1981".
- 81065237 issued "c1981.".
- 81065237 language "eng".
- 81065237 publisher "Pennington, NJ (10 South Main St., Pennington 08534) : Electrochemical Society,".
- 81065237 subject "621.3815/2 19".
- 81065237 subject "Plasma etching Congresses.".
- 81065237 subject "Semiconductors Etching Congresses.".
- 81065237 subject "TK7871.85 .S973 1980".
- 81065237 title "Plasma processing : proceedings of the Symposium on Plasma Etching and Deposition / edited by R.G. Frieser, C.J. Mogab ; [sponsored by] Dielectrics and Insulation and Electronics Divisions.".
- 81065237 type "text".