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- 82060280 contributor B4202059.
- 82060280 contributor B4202060.
- 82060280 created "1982.".
- 82060280 date "1982".
- 82060280 date "1982.".
- 82060280 dateCopyrighted "1982.".
- 82060280 description "Includes bibliographical references and indexes.".
- 82060280 extent "viii, 179 p. :".
- 82060280 identifier "0892523689 (pbk.)".
- 82060280 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 333".
- 82060280 issued "1982".
- 82060280 issued "1982.".
- 82060280 language "eng".
- 82060280 publisher "Bellingham, Wash. : International Society for Optical Engineering,".
- 82060280 subject "621.381/74 19".
- 82060280 subject "Photolithography Congresses.".
- 82060280 subject "Photoresists Congresses.".
- 82060280 subject "TK7874 .S85 1982".
- 82060280 title "Submicron lithography / Phillip D. Blais, chairman/editor ; in cooperation with the International Society for Hybrid Microelectronics, the Northern California Microphotomask/Masking Working Group, the Materials Research Society, March 29-30, 1982, Santa Clara, California.".
- 82060280 type "text".