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- 83050213%2F%2Fr852 alternative "Optical microlithography 2.".
- 83050213%2F%2Fr852 alternative "Optical microlithography two.".
- 83050213%2F%2Fr852 contributor B4426449.
- 83050213%2F%2Fr852 contributor B4426450.
- 83050213%2F%2Fr852 created "c1983.".
- 83050213%2F%2Fr852 date "1983".
- 83050213%2F%2Fr852 date "c1983.".
- 83050213%2F%2Fr852 dateCopyrighted "c1983.".
- 83050213%2F%2Fr852 description "Includes bibliographical references and index.".
- 83050213%2F%2Fr852 extent "vi, 251 p. :".
- 83050213%2F%2Fr852 identifier "0892524294 (pbk.)".
- 83050213%2F%2Fr852 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 394".
- 83050213%2F%2Fr852 issued "1983".
- 83050213%2F%2Fr852 issued "c1983.".
- 83050213%2F%2Fr852 language "eng".
- 83050213%2F%2Fr852 publisher "Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering,".
- 83050213%2F%2Fr852 subject "621.381/74 19".
- 83050213%2F%2Fr852 subject "Integrated circuits Very large scale integration Congresses.".
- 83050213%2F%2Fr852 subject "Microlithography Congresses.".
- 83050213%2F%2Fr852 subject "TR940 .O68 1983".
- 83050213%2F%2Fr852 title "Optical microlithography II : technology for the 1980s : March 16-17, 1983, Santa Clara, California / Harry L. Stover, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering, in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.".
- 83050213%2F%2Fr852 type "text".