Matches in Library of Congress for { <http://lccn.loc.gov/84021744> ?p ?o. }
Showing items 1 to 23 of
23
with 100 items per page.
- 84021744 alternative "Radiation-sensitive polymers.".
- 84021744 contributor B4645710.
- 84021744 contributor B4645711.
- 84021744 created "1984.".
- 84021744 date "1984".
- 84021744 date "1984.".
- 84021744 dateCopyrighted "1984.".
- 84021744 description "Includes bibliographies and indexes.".
- 84021744 extent "viii, 494 p. :".
- 84021744 identifier "0841208719".
- 84021744 isPartOf "ACS symposium series, 0097-6156 ; 266".
- 84021744 issued "1984".
- 84021744 issued "1984.".
- 84021744 language "eng".
- 84021744 publisher "Washington, D.C. : The Society,".
- 84021744 subject "621.381/73 19".
- 84021744 subject "Microelectronics Materials Congresses.".
- 84021744 subject "Microlithography Materials Congresses.".
- 84021744 subject "Photoresists Congresses.".
- 84021744 subject "Polymers Congresses.".
- 84021744 subject "TK7871.15.P6 M37 1984".
- 84021744 title "Materials for microlithography : radiation-sensitive polymers / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984.".
- 84021744 type "text".