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- 87619864 contributor B5567432.
- 87619864 contributor B5567433.
- 87619864 created "1987.".
- 87619864 date "1987".
- 87619864 date "1987.".
- 87619864 dateCopyrighted "1987.".
- 87619864 description "Bibliography: p. 24-26.".
- 87619864 extent "iv, 667 p. :".
- 87619864 isPartOf "NBS special publication ; 400-79".
- 87619864 isPartOf "Semiconductor measurement technology".
- 87619864 issued "1987".
- 87619864 issued "1987.".
- 87619864 language "eng".
- 87619864 publisher "Gaithersburg, MD : U.S. Dept. of Commerce, National Bureau of Standards ; Washington, DC : For sale by the Supt. of Docs., U.S. G.P.O.,".
- 87619864 subject "602/.18 s 621.3815/2 19".
- 87619864 subject "Ion implantation Computer simulation.".
- 87619864 subject "Monte Carlo method.".
- 87619864 subject "QC100 .U57 no. 400-99 TK7871.85".
- 87619864 subject "Semiconductor doping Computer simulation.".
- 87619864 title "Results of the Monte Carlo calculation of one- and two-dimensional distributions of particles and damage : ion implanted dopants in silicon / John Albers ; sponsored by Defense Advanced Research Projects Agency.".
- 87619864 type "text".