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- 89022834 contributor B5865055.
- 89022834 created "c1990.".
- 89022834 date "1990".
- 89022834 date "c1990.".
- 89022834 dateCopyrighted "c1990.".
- 89022834 description "Includes bibliographical references.".
- 89022834 extent "xxiii, 523 p. :".
- 89022834 identifier "0815512201 :".
- 89022834 identifier 89022834.html.
- 89022834 isPartOf "Materials science and process technology series".
- 89022834 issued "1990".
- 89022834 issued "c1990.".
- 89022834 language "eng".
- 89022834 publisher "Park Ridge, N.J., U.S.A. : Noyes Publications,".
- 89022834 subject "621.044 19".
- 89022834 subject "Plasma engineering.".
- 89022834 subject "Plasma etching.".
- 89022834 subject "Semiconductors Etching.".
- 89022834 subject "TA2020 .H37 1990".
- 89022834 title "Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions / edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood.".
- 89022834 type "text".