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- 89043521 contributor B5886796.
- 89043521 contributor B5886797.
- 89043521 created "c1990.".
- 89043521 date "1990".
- 89043521 date "c1990.".
- 89043521 dateCopyrighted "c1990.".
- 89043521 description "Includes bibliographical references and index.".
- 89043521 extent "vii, 307 p. :".
- 89043521 identifier "0819402214".
- 89043521 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 1185".
- 89043521 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 1185.".
- 89043521 issued "1990".
- 89043521 issued "c1990.".
- 89043521 language "eng".
- 89043521 publisher "Bellingham, Wash., USA : The Society,".
- 89043521 subject "621.381/52 20".
- 89043521 subject "Ion beam lithography Congresses.".
- 89043521 subject "Lithography, Electron beam Congresses.".
- 89043521 subject "Plasma etching Congresses.".
- 89043521 subject "Semiconductors Etching Congresses.".
- 89043521 subject "TK7871.85 .D795 1990".
- 89043521 title "Dry processing for submicrometer lithography : 12-13 October 1989, Santa Clara, California / James Bondur, Alan R. Reinberg, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering.".
- 89043521 type "text".