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- 89060655 contributor B5893205.
- 89060655 contributor B5893206.
- 89060655 contributor B5893207.
- 89060655 created "c1989.".
- 89060655 date "1989".
- 89060655 date "c1989.".
- 89060655 dateCopyrighted "c1989.".
- 89060655 description "Includes bibliographical references.".
- 89060655 extent "viii, 388 p. :".
- 89060655 identifier "0819401242".
- 89060655 isPartOf "Proceedings / SPIE--the international society for optical engineering ;v. 1089".
- 89060655 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 1089.".
- 89060655 issued "1989".
- 89060655 issued "c1989.".
- 89060655 language "eng".
- 89060655 publisher "Bellingham, Wash., USA : SPIE,".
- 89060655 subject "621.381/52 20".
- 89060655 subject "Ion beam lithography Congresses.".
- 89060655 subject "Lithography, Electron beam Congresses.".
- 89060655 subject "TK7874 .E4827 1989".
- 89060655 subject "X-ray lithography Congresses.".
- 89060655 title "Electron-beam, X-ray, and ion-beam technology : submicrometer lithographies VIII : 1-3 March 1989, San Jose, California / Arnold W. Yanof, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering.".
- 89060655 type "text".