Matches in Library of Congress for { <http://lccn.loc.gov/91018643> ?p ?o. }
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- 91018643 contributor B6370190.
- 91018643 created "c1992.".
- 91018643 date "1992".
- 91018643 date "c1992.".
- 91018643 dateCopyrighted "c1992.".
- 91018643 description "Includes bibliographical references and index.".
- 91018643 extent "xvi, 235 p. :".
- 91018643 identifier "0815512880 :".
- 91018643 identifier 91018643.html.
- 91018643 isPartOf "Materials science and process technology series".
- 91018643 issued "1992".
- 91018643 issued "c1992.".
- 91018643 language "eng".
- 91018643 publisher "Park Ridge, N.J., U.S.A. : Noyes Publications,".
- 91018643 subject "621.39/5 20".
- 91018643 subject "Integrated circuits Ultra large scale integration Materials.".
- 91018643 subject "Integrated circuits Very large scale integration Materials.".
- 91018643 subject "TK7871.15.T85 S36 1992".
- 91018643 subject "Tungsten.".
- 91018643 subject "Vapor-plating.".
- 91018643 title "Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications / by John E.J. Schmitz.".
- 91018643 type "text".