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- 91067546 contributor B6412803.
- 91067546 contributor B6412804.
- 91067546 created "c1992.".
- 91067546 date "1992".
- 91067546 date "c1992.".
- 91067546 dateCopyrighted "c1992.".
- 91067546 description "Includes bibliographical references and index.".
- 91067546 extent "vii, 222 p. :".
- 91067546 identifier "0819407240".
- 91067546 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 1593".
- 91067546 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 1593.".
- 91067546 issued "1992".
- 91067546 issued "c1992.".
- 91067546 language "eng".
- 91067546 publisher "Bellingham, Wash. : SPIE,".
- 91067546 subject "621.3815/2 20".
- 91067546 subject "Microelectronics Materials Congresses.".
- 91067546 subject "Plasma etching Congresses.".
- 91067546 subject "Semiconductors Etching Congresses.".
- 91067546 subject "TK7871.85 .D78 1992".
- 91067546 title "Dry etch technology : 9-10-September 1991, San Jose, California / Deepak Ranadive, chair ; sponsored and published by SPIE--the International Society for Optical Engineering.".
- 91067546 type "text".