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- 92005585 alternative "Litografické techniky. English.".
- 92005585 contributor B6617780.
- 92005585 contributor B6617781.
- 92005585 created "1993.".
- 92005585 date "1993".
- 92005585 date "1993.".
- 92005585 dateCopyrighted "1993.".
- 92005585 description "Includes bibliographical references and index.".
- 92005585 extent "376 p. :".
- 92005585 identifier "0444988467".
- 92005585 isPartOf "Materials science monographs ; 76".
- 92005585 issued "1993".
- 92005585 issued "1993.".
- 92005585 language "eng cze".
- 92005585 language "eng".
- 92005585 publisher "Amsterdam ; New York : Elsevier,".
- 92005585 subject "621.381/52 20".
- 92005585 subject "Integrated circuits Very large scale integration Design and construction.".
- 92005585 subject "Lithography, Electron beam.".
- 92005585 subject "Microlithography.".
- 92005585 subject "Semiconductors Design and construction.".
- 92005585 subject "TK7871.85 .B375313 1993".
- 92005585 subject "X-ray lithography.".
- 92005585 title "Litografické techniky. English.".
- 92005585 title "Resists in microlithography and printing / Bohumil Bednář, Jaroslav Králíček, and Jaromír Zachoval ; with contributions by Andrey V. Yelcov and Tatyana A. Yurre.".
- 92005585 type "text".