Matches in Library of Congress for { <http://lccn.loc.gov/92008779> ?p ?o. }
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- 92008779 contributor B6621583.
- 92008779 contributor B6621584.
- 92008779 contributor B6621585.
- 92008779 created "c1992.".
- 92008779 date "1992".
- 92008779 date "c1992.".
- 92008779 dateCopyrighted "c1992.".
- 92008779 description "Includes bibliographical references and indexes.".
- 92008779 extent "2 v. (xxxi, 1561 p.) :".
- 92008779 identifier "1851668578 (set)".
- 92008779 identifier "1851668586 (v. 1)".
- 92008779 identifier "1851668594 (v. 2)".
- 92008779 identifier 92008779-d.html.
- 92008779 issued "1992".
- 92008779 issued "c1992.".
- 92008779 language "eng".
- 92008779 publisher "London ; New York : Elsevier Applied Science,".
- 92008779 subject "620.1/12 20".
- 92008779 subject "Residual stresses Congresses.".
- 92008779 subject "TA417.6 .R47 1992".
- 92008779 title "Residual stresses-III : science and technology / edited by H. Fujiwara, T. Abe, and K. Tanaka.".
- 92008779 type "text".