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- 92019421 alternative "Optical microlithography.".
- 92019421 contributor B6634200.
- 92019421 created "c1992.".
- 92019421 date "1992".
- 92019421 date "c1992.".
- 92019421 dateCopyrighted "c1992.".
- 92019421 description "Includes bibliographical references and index.".
- 92019421 extent "xviii, 676 p. :".
- 92019421 identifier "0819409855 (hard)".
- 92019421 identifier "0819409863 (soft)".
- 92019421 isPartOf "SPIE milestones series ; v. MS 55".
- 92019421 issued "1992".
- 92019421 issued "c1992.".
- 92019421 language "eng".
- 92019421 publisher "Bellingham, Wash. : SPIE Optical Engineering Press,".
- 92019421 subject "621.3815/2 20".
- 92019421 subject "Masks (Electronics)".
- 92019421 subject "Microlithography.".
- 92019421 subject "Semiconductors Design and construction.".
- 92019421 subject "TK7871.85 .S426 1992".
- 92019421 title "Selected papers on optical microlithography / Harry L. Stover, editor.".
- 92019421 type "text".