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- 92021803 contributor B6636887.
- 92021803 created "c1993.".
- 92021803 date "1993".
- 92021803 date "c1993.".
- 92021803 dateCopyrighted "c1993.".
- 92021803 description "Includes bibliographical references and index.".
- 92021803 extent "viii, 268 p. :".
- 92021803 identifier "0895737450".
- 92021803 identifier "3527278427".
- 92021803 issued "1993".
- 92021803 issued "c1993.".
- 92021803 language "eng".
- 92021803 publisher "New York : VCH,".
- 92021803 subject "548/.83 20".
- 92021803 subject "QC482.D5 X74 1993".
- 92021803 subject "X-rays Diffraction.".
- 92021803 subject "X-rays Industrial applications.".
- 92021803 title "X-ray diffraction at elevated temperatures : a method for in situ process analysis / D.D.L. Chung ... [et al.].".
- 92021803 type "text".