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- 92036072 contributor B6653251.
- 92036072 contributor B6653252.
- 92036072 created "1993.".
- 92036072 date "1993".
- 92036072 date "1993.".
- 92036072 dateCopyrighted "1993.".
- 92036072 description "Includes bibliographical references and index.".
- 92036072 extent "xii, 183 p. :".
- 92036072 identifier "0470220635 (J. Wiley)".
- 92036072 identifier "8122405614 (Wiley Eastern)".
- 92036072 identifier 92036072.html.
- 92036072 identifier 92036072.html.
- 92036072 issued "1993".
- 92036072 issued "1993.".
- 92036072 language "eng".
- 92036072 publisher "New York : J. Wiley,".
- 92036072 subject "621.3815/31 20".
- 92036072 subject "Integrated circuits Masks.".
- 92036072 subject "Ion beam lithograph.".
- 92036072 subject "Lithography, Electron beam.".
- 92036072 subject "TK7872.M3 P38 1993".
- 92036072 subject "X-ray lithography.".
- 92036072 title "Patterning of material layers in submicron region / U.S. Tandon, W.S. Khokle.".
- 92036072 type "text".