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- 93084071 contributor B6958417.
- 93084071 contributor B6958418.
- 93084071 created "c1993.".
- 93084071 date "1993".
- 93084071 date "c1993.".
- 93084071 dateCopyrighted "c1993.".
- 93084071 description "Includes bibliographical references and index.".
- 93084071 extent "vii, 470 p. :".
- 93084071 identifier "0819411582 (pbk.)".
- 93084071 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 1924".
- 93084071 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 1924.".
- 93084071 issued "1993".
- 93084071 issued "c1993.".
- 93084071 language "eng".
- 93084071 publisher "Bellingham, Wash. : The Society,".
- 93084071 subject "621.3815/31 20".
- 93084071 subject "Ion beam lithography Congresses.".
- 93084071 subject "Lithography, Electron beam Congresses.".
- 93084071 subject "Masks (Electronics) Congresses.".
- 93084071 subject "Semiconductors Etching Congresses.".
- 93084071 subject "TK7874 .E48178 1993".
- 93084071 subject "X-ray lithography Congresses.".
- 93084071 title "Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing III : 1-2 March 1993, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.".
- 93084071 type "text".