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- 94024599 contributor B7186239.
- 94024599 created "c1995.".
- 94024599 date "1995".
- 94024599 date "c1995.".
- 94024599 dateCopyrighted "c1995.".
- 94024599 description "Includes bibliographucal references (p. 201-214) and index.".
- 94024599 extent "ix, 216 p. :".
- 94024599 identifier "0387583173 (New York : acid-free paper)".
- 94024599 identifier "3540583173 (Berlin : acid-free paper)".
- 94024599 isPartOf "Springer series in materials science ; 24".
- 94024599 isPartOf "Springer series in materials science ; v. 24.".
- 94024599 issued "1995".
- 94024599 issued "c1995.".
- 94024599 language "eng".
- 94024599 publisher "Berlin ; New York : Springer-Verlag,".
- 94024599 subject "621.3815/2 20".
- 94024599 subject "Contamination (Technology)".
- 94024599 subject "Semiconductors Defects.".
- 94024599 subject "Silicon Defects.".
- 94024599 subject "Silicon Inclusions.".
- 94024599 subject "TK7871.85 .G66 1995".
- 94024599 title "Metal impurities in silicon-device fabrication / Klaus Graff.".
- 94024599 type "text".