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- 94028954 contributor B7191437.
- 94028954 contributor B7191438.
- 94028954 created "c1994.".
- 94028954 date "1994".
- 94028954 date "c1994.".
- 94028954 dateCopyrighted "c1994.".
- 94028954 description "Includes bibliographical references (p. 559-564) and index.".
- 94028954 extent "xxvi, 572 p. :".
- 94028954 identifier "0471005770".
- 94028954 identifier 94028954.html.
- 94028954 identifier 94028954.html.
- 94028954 identifier 94028954.html.
- 94028954 issued "1994".
- 94028954 issued "c1994.".
- 94028954 language "eng".
- 94028954 publisher "New York : Wiley,".
- 94028954 subject "530.4/4 20".
- 94028954 subject "Plasma chemistry.".
- 94028954 subject "Plasma dynamics.".
- 94028954 subject "Plasma etching.".
- 94028954 subject "QC718.5.D9 L54 1994".
- 94028954 subject "Thin films Surfaces.".
- 94028954 title "Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg.".
- 94028954 type "text".