Matches in Library of Congress for { <http://lccn.loc.gov/94039696> ?p ?o. }
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- 94039696 contributor B7203933.
- 94039696 created "c1995.".
- 94039696 date "1995".
- 94039696 date "c1995.".
- 94039696 dateCopyrighted "c1995.".
- 94039696 description "Includes bibliographical references and index.".
- 94039696 extent "xii, 292 p. :".
- 94039696 identifier "0442010796".
- 94039696 identifier 94039696-d.html.
- 94039696 identifier 94039696-t.html.
- 94039696 issued "1995".
- 94039696 issued "c1995.".
- 94039696 language "eng".
- 94039696 publisher "New York : Van Nostrand Reinhold,".
- 94039696 subject "621.3815/2 20".
- 94039696 subject "Chemical vapor deposition.".
- 94039696 subject "Microelectronics Materials.".
- 94039696 subject "Microelectronics industry.".
- 94039696 subject "TK7836 .S54 1995".
- 94039696 title "Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram.".
- 94039696 type "text".