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- 94065772 contributor B7217719.
- 94065772 contributor B7217720.
- 94065772 created "c1994.".
- 94065772 date "1994".
- 94065772 date "c1994.".
- 94065772 dateCopyrighted "c1994.".
- 94065772 description "Includes bibliographical references and index.".
- 94065772 extent "ix, 488 p. :".
- 94065772 identifier "0819415634".
- 94065772 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 2254".
- 94065772 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2254.".
- 94065772 issued "1994".
- 94065772 issued "c1994.".
- 94065772 language "eng".
- 94065772 publisher "Bellingham, Wash. : SPIE,".
- 94065772 subject "621.3815/31 20".
- 94065772 subject "Integrated circuits Masks Congresses.".
- 94065772 subject "Microlithography Congresses.".
- 94065772 subject "TK7874 .P464 1994".
- 94065772 title "Photomask and X-ray mask technology : 22 April 1994, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, chair/editor ; sponsored by Japan Chapter of SPIE ; cosponsored by BACUS, SPIE--the International Society for Optical Engineering.".
- 94065772 type "text".