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- 94065789 contributor B7217741.
- 94065789 contributor B7217742.
- 94065789 created "c1994.".
- 94065789 date "1994".
- 94065789 date "c1994.".
- 94065789 dateCopyrighted "c1994.".
- 94065789 description "Includes bibliographical references and index.".
- 94065789 extent "vii, 420 p. :".
- 94065789 identifier "0819414891".
- 94065789 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 2194".
- 94065789 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2194.".
- 94065789 issued "1994".
- 94065789 issued "c1994.".
- 94065789 language "eng".
- 94065789 publisher "Bellingham, Wash. : SPIE,".
- 94065789 subject "621.3815/31 20".
- 94065789 subject "Ion beam lithography Congresses.".
- 94065789 subject "Lithography, Electron beam Congresses.".
- 94065789 subject "Masks (Electronics) Congresses.".
- 94065789 subject "Semiconductors Etching Congresses.".
- 94065789 subject "TK7874 .E4818 1994".
- 94065789 subject "X-ray lithography Congresses.".
- 94065789 title "Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing IV : 28 February-1 March 1994, San Jose, California / David O. Patterson, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.".
- 94065789 type "text".