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- 94069900 contributor B7221179.
- 94069900 contributor B7221180.
- 94069900 created "c1995.".
- 94069900 date "1995".
- 94069900 date "c1995.".
- 94069900 dateCopyrighted "c1995.".
- 94069900 description "Includes bibliographical references and index.".
- 94069900 extent "vii, 450 p. :".
- 94069900 identifier "0819417858".
- 94069900 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 2437".
- 94069900 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2437.".
- 94069900 issued "1995".
- 94069900 issued "c1995.".
- 94069900 language "eng".
- 94069900 publisher "Bellingham, Wash., USA : SPIE,".
- 94069900 subject "621.3815/31 20".
- 94069900 subject "Extreme ultraviolet lithography Congresses.".
- 94069900 subject "Integrated circuits Masks Congresses.".
- 94069900 subject "Ion beam lithography Congresses.".
- 94069900 subject "Lithography, Electron beam Congresses.".
- 94069900 subject "TK7874 .E4835 1995".
- 94069900 subject "X-ray lithography Congresses.".
- 94069900 title "Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California / John M. Warlaumont, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.".
- 94069900 type "text".