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- 95011665 contributor B7456609.
- 95011665 created "1995.".
- 95011665 date "1995".
- 95011665 date "1995.".
- 95011665 dateCopyrighted "1995.".
- 95011665 description "Includes bibliographical references and index.".
- 95011665 extent "xiii, 646 p. :".
- 95011665 identifier "0792334582 (acid-free paper)".
- 95011665 identifier 95011665-d.html.
- 95011665 identifier 95011665-t.html.
- 95011665 isPartOf "NATO ASI series. Series E, Applied sciences ; no. 290.".
- 95011665 isPartOf "NATO ASI series. Series E, Applied sciences ; vol. 290".
- 95011665 issued "1995".
- 95011665 issued "1995.".
- 95011665 language "eng".
- 95011665 publisher "Dordrecht ; Boston : Kluwer Academic Publishers,".
- 95011665 subject "620/.44 20".
- 95011665 subject "Interfaces (Physical sciences)".
- 95011665 subject "Plasma-enhanced chemical vapor deposition.".
- 95011665 subject "Surfaces (Technology)".
- 95011665 subject "TS695 .M37 1995".
- 95011665 subject "Thin films.".
- 95011665 subject "Vapor plating.".
- 95011665 title "Materials and processes for surface and interface engineering / edited by Yves Pauleau.".
- 95011665 type "text".