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- 95069776 contributor B7506316.
- 95069776 contributor B7506317.
- 95069776 created "1996.".
- 95069776 date "1996".
- 95069776 date "1996.".
- 95069776 dateCopyrighted "1996.".
- 95069776 description "Includes bibliographical references.".
- 95069776 extent "ix, 636 p. :".
- 95069776 identifier "0819419850 (pbk.)".
- 95069776 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2621.".
- 95069776 isPartOf "SPIE proceedings series ; v. 2621".
- 95069776 issued "1996".
- 95069776 issued "1996.".
- 95069776 language "eng".
- 95069776 publisher "Bellingham, WA : SPIE,".
- 95069776 subject "621.3815/31 21".
- 95069776 subject "Integrated circuits Masks Congresses.".
- 95069776 subject "Microlithography Congresses.".
- 95069776 subject "Photoresists Congresses.".
- 95069776 subject "TK7872.M3 S96 1995".
- 95069776 title "15th Annual Symposium on Photomask Technology and Management : 20-22 September 1995, Santa Clara, California / Gilbert Shelden, James N. Wiley, chairs/editors.".
- 95069776 type "text".