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- 95072312 contributor B7508218.
- 95072312 contributor B7508219.
- 95072312 created "c1996.".
- 95072312 date "1996".
- 95072312 date "c1996.".
- 95072312 dateCopyrighted "c1996.".
- 95072312 description "Includes bibliographic references and index.".
- 95072312 extent "vii, 412 p. :".
- 95072312 identifier "0819420999".
- 95072312 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 2723".
- 95072312 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2723.".
- 95072312 issued "1996".
- 95072312 issued "c1996.".
- 95072312 language "eng".
- 95072312 publisher "Bellingham, Wash. : SPIE,".
- 95072312 subject "621.3815/31 21".
- 95072312 subject "Extreme ultraviolet lithography Congresses.".
- 95072312 subject "Integrated circuits Masks Congresses.".
- 95072312 subject "Ion beam lithography Congresses.".
- 95072312 subject "Lithography, Electron beam Congresses.".
- 95072312 subject "TK7874 .E48352 1996".
- 95072312 subject "X-ray lithography Congresses.".
- 95072312 title "Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.".
- 95072312 type "text".