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- 95083756 contributor B7516091.
- 95083756 contributor B7516092.
- 95083756 created "c1996.".
- 95083756 date "1996".
- 95083756 date "c1996.".
- 95083756 dateCopyrighted "c1996.".
- 95083756 description "Includes bibliographical references and indexes.".
- 95083756 extent "xv, 780 p. :".
- 95083756 identifier "156677151X".
- 95083756 isPartOf "Proceedings (Electrochemical Society) ; v. 96-1.".
- 95083756 isPartOf "Proceedings / Electrochemical Society ; v. 96-1".
- 95083756 issued "1996".
- 95083756 issued "c1996.".
- 95083756 language "eng".
- 95083756 publisher "Pennington, NJ : Electrochemical Society,".
- 95083756 subject "546/.6832 20".
- 95083756 subject "Dielectrics Surfaces Congresses.".
- 95083756 subject "QC585.75.S55 I58 1996".
- 95083756 subject "Silica Surfaces Congresses.".
- 95083756 subject "Silicon dioxide films Congresses.".
- 95083756 subject "Surface chemistry Congresses.".
- 95083756 subject "Surfaces (Technology) Congresses.".
- 95083756 title "The physics and chemistry of SiO₂ and the Si-SiO₂ interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO₂ and the Si-SiO₂ Interface / editors, Hisham Z. Massoud, Edward H. Poindexter, C. Robert Helms.".
- 95083756 type "text".