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- 96067849 contributor B7800448.
- 96067849 contributor B7800449.
- 96067849 created "c1996.".
- 96067849 date "1996".
- 96067849 date "c1996.".
- 96067849 dateCopyrighted "c1996.".
- 96067849 description "Includes bibliographic references and index.".
- 96067849 extent "xiii, 530 p. :".
- 96067849 identifier "0819421790".
- 96067849 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 2793".
- 96067849 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 2793.".
- 96067849 issued "1996".
- 96067849 issued "c1996.".
- 96067849 language "eng".
- 96067849 publisher "Bellingham, Wash. : SPIE,".
- 96067849 subject "621.3815/31 21".
- 96067849 subject "Integrated circuits Masks Congresses.".
- 96067849 subject "Masks (Electronics) Congresses.".
- 96067849 subject "Microlithography Congresses.".
- 96067849 subject "TK7872.M3 P4723 1996".
- 96067849 subject "X-ray lithography Congresses.".
- 96067849 title "Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan / Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering.".
- 96067849 type "text".