Matches in Library of Congress for { <http://lccn.loc.gov/97016609> ?p ?o. }
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- 97016609 contributor B8042858.
- 97016609 contributor B8042859.
- 97016609 contributor B8042860.
- 97016609 created "c1997.".
- 97016609 date "1997".
- 97016609 date "c1997.".
- 97016609 dateCopyrighted "c1997.".
- 97016609 description "Includes bibliographical references and index.".
- 97016609 extent "x, 613 p. :".
- 97016609 identifier "0792345673 (acid-free paper)".
- 97016609 identifier 97016609-d.html.
- 97016609 identifier 97016609-t.html.
- 97016609 isPartOf "NATO ASI series. Series E, Applied sciences ; no. 336.".
- 97016609 isPartOf "NATO ASI series. Series E., Applied sciences ; vol. 336".
- 97016609 issued "1997".
- 97016609 issued "c1997.".
- 97016609 language "eng".
- 97016609 publisher "Dordrecht ; Boston : Kluwer Academic Publishers,".
- 97016609 subject "621.3815/2 21".
- 97016609 subject "Plasma chemistry Industrial applications.".
- 97016609 subject "Plasma engineering.".
- 97016609 subject "Plasma etching Industrial applications.".
- 97016609 subject "Semiconductors Etching.".
- 97016609 subject "TA2020 .P532 1997".
- 97016609 title "Plasma processing of semiconductors / edited by P.F. Williams.".
- 97016609 type "text".