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- 97136221 contributor B8139867.
- 97136221 contributor B8139868.
- 97136221 created "c1996.".
- 97136221 date "1996".
- 97136221 date "c1996.".
- 97136221 dateCopyrighted "c1996.".
- 97136221 description "Includes bibliographical references (p. 222-232) and indexes.".
- 97136221 extent "ix, 235 p. :".
- 97136221 identifier "1557524351".
- 97136221 isPartOf "OSA trends in optics and photonics ; v. 4".
- 97136221 issued "1996".
- 97136221 issued "c1996.".
- 97136221 language "eng".
- 97136221 publisher "Washington, DC : The Society,".
- 97136221 subject "621.3815/31 21".
- 97136221 subject "Interferometry Congresses.".
- 97136221 subject "Lasers Industrial applications Congresses.".
- 97136221 subject "Optical coatings Congresses.".
- 97136221 subject "Photolithography Congresses.".
- 97136221 subject "TS517.2 .E98 1996".
- 97136221 subject "Ultraviolet radiation Industrial applications Congresses.".
- 97136221 title "Extreme ultraviolet lithography : from the topical meeting, May 1-3, 1996, Boston, Massachusetts / edited by Glenn D. Kubiak and Don R. Kania ; sponsored by Optical Society of America.".
- 97136221 type "text".