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- 97191948 contributor B8201718.
- 97191948 contributor B8201719.
- 97191948 created "1997.".
- 97191948 date "1997".
- 97191948 date "1997.".
- 97191948 dateCopyrighted "1997.".
- 97191948 description "Includes bibliographical references (p. 6-7).".
- 97191948 extent "iv, 26 p. :".
- 97191948 isPartOf "NBS special publication ; 400-99. Semiconductor measurement technology".
- 97191948 isPartOf "NBS special publication ; 400-99.".
- 97191948 isPartOf "NBS special publication. Semiconductor measurement technology.".
- 97191948 issued "1997".
- 97191948 issued "1997.".
- 97191948 language "eng".
- 97191948 publisher "Gaithersburg, MD : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology ; Washington, DC : For sale by the Supt. of Docs., U.S. G.P.O.,".
- 97191948 subject "602/.18 s 621.3815/2 21".
- 97191948 subject "Ellipsometry.".
- 97191948 subject "QC100 .U57 no. 400-99 TK7871.15.F5".
- 97191948 subject "Semiconductor films Measurement.".
- 97191948 subject "Thin films Measurement.".
- 97191948 title "The results of an interlaboratory study of ellipsometric measurements of thin film silicon dioxide on silicon / Barbara J. Belzer and David L. Blackburn.".
- 97191948 type "text".