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- 98011717 contributor B8330013.
- 98011717 created "1999.".
- 98011717 date "1999".
- 98011717 date "1999.".
- 98011717 dateCopyrighted "1999.".
- 98011717 description "Includes bibliographical references (p. 205-211) and index.".
- 98011717 extent "ix, 221 p. :".
- 98011717 identifier "0521591759 (hardback)".
- 98011717 identifier 98011717.html.
- 98011717 identifier 98011717.html.
- 98011717 isPartOf "Cambridge studies in semiconductor physics and microelectronic engineering ; 8".
- 98011717 issued "1999".
- 98011717 issued "1999.".
- 98011717 language "eng".
- 98011717 publisher "Cambridge ; New York : Cambridge University Press,".
- 98011717 subject "621.3815/2 21".
- 98011717 subject "Plasma etching.".
- 98011717 subject "Semiconductors Etching.".
- 98011717 subject "TK7871.85 .H54 1999".
- 98011717 title "Plasma processes for semiconductor fabrication / W.N.G. Hitchon.".
- 98011717 type "text".