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- 98122044 alternative "Photomask and X-ray mask technology 4".
- 98122044 alternative "Photomask and X-ray mask technology four".
- 98122044 contributor B8422251.
- 98122044 contributor B8422252.
- 98122044 created "c1997.".
- 98122044 date "1997".
- 98122044 date "c1997.".
- 98122044 dateCopyrighted "c1997.".
- 98122044 description "Includes bibliographic references and author index.".
- 98122044 extent "xiii, 504 p. :".
- 98122044 identifier "0819425168".
- 98122044 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 3096".
- 98122044 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3096.".
- 98122044 issued "1997".
- 98122044 issued "c1997.".
- 98122044 language "eng".
- 98122044 publisher "Bellingham, Washington : SPIE,".
- 98122044 subject "621.3815/31 21".
- 98122044 subject "Integrated circuits Masks Congresses.".
- 98122044 subject "Masks (Electronics) Congresses.".
- 98122044 subject "Microlithography Congresses.".
- 98122044 subject "TK7872.M4 P46 1997".
- 98122044 subject "X-ray lithography Congresses.".
- 98122044 title "Photomask and X-ray mask technology 4".
- 98122044 title "Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering ; supporting societies, the Japan Society of Applied Physics ... [et al.] ; published by SPIE--the International Society for Optical Engineering.".
- 98122044 title "Photomask and X-ray mask technology four".
- 98122044 type "text".