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- 98122105 contributor B8422351.
- 98122105 contributor B8422352.
- 98122105 created "c1997.".
- 98122105 date "1997".
- 98122105 date "c1997.".
- 98122105 dateCopyrighted "c1997.".
- 98122105 description "Includes bibliographical references and index.".
- 98122105 extent "ix, 412 p. :".
- 98122105 identifier "0819424625".
- 98122105 isPartOf "Proceedings of SPIE ; v. 3048".
- 98122105 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3048.".
- 98122105 issued "1997".
- 98122105 issued "c1997.".
- 98122105 language "eng".
- 98122105 publisher "Bellingham, Wash. : SPIE,".
- 98122105 subject "621.3815/31 21".
- 98122105 subject "Electron beams Industrial applications Congresses.".
- 98122105 subject "Lithography, Electron beam Congresses.".
- 98122105 subject "Masks (Electronics) Congresses.".
- 98122105 subject "TK7874 .E524 1997".
- 98122105 subject "X-ray lithography Congresses.".
- 98122105 subject "X-rays Industrial applications Congresses.".
- 98122105 title "Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California / David E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.".
- 98122105 type "text".