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- 98212553 contributor B8519307.
- 98212553 created "1998.".
- 98212553 date "1998".
- 98212553 date "1998.".
- 98212553 dateCopyrighted "1998.".
- 98212553 description "Includes bibliographical references and index.".
- 98212553 extent "x, 137 p. :".
- 98212553 identifier "389649306X".
- 98212553 isPartOf "Series in microelectronics, 0936-5364 ; v. 74".
- 98212553 issued "1998".
- 98212553 issued "1998.".
- 98212553 language "eng ger".
- 98212553 language "eng".
- 98212553 publisher "Konstanz : Hartung-Gorre,".
- 98212553 subject "621.3815/2 21".
- 98212553 subject "Electrodiffusion.".
- 98212553 subject "Metallizing.".
- 98212553 subject "Microstructure.".
- 98212553 subject "Semiconductors Design and construction.".
- 98212553 subject "TK7871.85 .S3857 1998".
- 98212553 subject "Thin films Electric properties.".
- 98212553 title "Electromigration behavior of a multi-layer metallization / Edgar Arthur Schönbächler.".
- 98212553 type "text".