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- 98227293 contributor B8535283.
- 98227293 contributor B8535284.
- 98227293 created "c1998.".
- 98227293 date "1998".
- 98227293 date "c1998.".
- 98227293 dateCopyrighted "c1998.".
- 98227293 description "Includes bibliographical references and index.".
- 98227293 extent "xiii, 616 p. :".
- 98227293 identifier "0819428647".
- 98227293 isPartOf "Proceedings / SPIE--the International Society for Optical Engineering ; v. 3412".
- 98227293 isPartOf "Proceedings of SPIE--the International Society for Optical Engineering ; v. 3412.".
- 98227293 issued "1998".
- 98227293 issued "c1998.".
- 98227293 language "eng".
- 98227293 publisher "Bellingham, Washington : SPIE,".
- 98227293 subject "621.3815/31 21".
- 98227293 subject "Integrated circuits Masks Congresses.".
- 98227293 subject "Masks (Electronics) Congresses.".
- 98227293 subject "Microlithography Congresses.".
- 98227293 subject "TK7878 .P56 1998".
- 98227293 subject "X-ray lithography Congresses.".
- 98227293 title "Photomask and X-ray mask technology V : 9-10 April, 1998, Kawasaki, Japan / Naoaki Aizaki, editor ; sponsored by Photomask Japan, BACUS, SPIE--The International Society for Optical Engineering ; supporting societies, The Japan Society of Applied Physics ... [et al.] ; published by SPIE--The International Society for Optical Engineering.".
- 98227293 type "text".