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- 99021926 contributor B8642576.
- 99021926 created "c2000.".
- 99021926 date "2000".
- 99021926 date "c2000.".
- 99021926 dateCopyrighted "c2000.".
- 99021926 description "Includes bibliographical references and index.".
- 99021926 extent "xiii, 312 p. :".
- 99021926 identifier "0471330019 (cloth : alk. paper)".
- 99021926 identifier 99021926.html.
- 99021926 identifier 99021926.html.
- 99021926 identifier 99021926.html.
- 99021926 issued "2000".
- 99021926 issued "c2000.".
- 99021926 language "eng".
- 99021926 publisher "New York : Wiley,".
- 99021926 subject "671.7/35 21".
- 99021926 subject "Physical vapor deposition.".
- 99021926 subject "TS695 .M32 2000".
- 99021926 subject "Thin films.".
- 99021926 title "Physical vapor deposition of thin films / John E. Mahan.".
- 99021926 type "text".