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- 99039825 contributor B8663410.
- 99039825 created "1999.".
- 99039825 date "1999".
- 99039825 date "1999.".
- 99039825 dateCopyrighted "1999.".
- 99039825 description "Includes bibliographical references.".
- 99039825 extent "xvii, 615 p. :".
- 99039825 identifier "1558994742".
- 99039825 identifier 99039825-d.html.
- 99039825 isPartOf "Material Research Society symposium proceedings ; v. 567".
- 99039825 isPartOf "Materials Research Society symposia proceedings ; v. 567.".
- 99039825 issued "1999".
- 99039825 issued "1999.".
- 99039825 language "eng".
- 99039825 publisher "Warrendale, PA : Materials Research Society,".
- 99039825 subject "621.39/5 21".
- 99039825 subject "Dielectrics Congresses.".
- 99039825 subject "Gate array circuits Materials Congresses.".
- 99039825 subject "Integrated circuits Ultra large scale integration Materials Congresses.".
- 99039825 subject "Silicon oxide films Congresses.".
- 99039825 subject "TK7874.76 .U48 1999".
- 99039825 title "Ultrathin SiO₂ and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A. / editors, H.R. Huff ... [et al.].".
- 99039825 type "text".