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- 99196375 alternative "Chemical mechanical planarization in integrated circuit device manufacturing".
- 99196375 contributor B8755230.
- 99196375 contributor B8755231.
- 99196375 contributor B8755232.
- 99196375 created "c1998.".
- 99196375 date "1998".
- 99196375 date "c1998.".
- 99196375 dateCopyrighted "c1998.".
- 99196375 description "Includes bibliographical references and indexes.".
- 99196375 extent "viii, 273 p. :".
- 99196375 identifier "156677201X".
- 99196375 isPartOf "Proceedings (Electrochemical Society) ; v. 98-7.".
- 99196375 isPartOf "Proceedings / Electrochemical Society ; v. 98-7".
- 99196375 issued "1998".
- 99196375 issued "c1998.".
- 99196375 language "eng".
- 99196375 publisher "Pennington, New Jersey : Electrochemical Society,".
- 99196375 subject "621.381 21".
- 99196375 subject "Chemical mechanical planarization Congresses.".
- 99196375 subject "Grinding and polishing Congresses.".
- 99196375 subject "Metals Pickling Congresses.".
- 99196375 subject "Microelectronics Materials Congresses.".
- 99196375 subject "Semiconductors Surfaces Congresses.".
- 99196375 subject "TK7871 .I585 1998".
- 99196375 title "Chemical mechanical planarization in integrated circuit device manufacturing".
- 99196375 title "Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing / editors, S. Raghavan, R.L. Opila, L. Zhang ; Electronics and Dielectric Science and Technology Divisions [of the Electrochemical Society].".
- 99196375 type "text".